The paper introduces the basic principles of film thermal resistor and the use of occasions release time: 2019 - 07 - 29 viewed: zero

Thin film platinum thermal resistance produced by a new platinum thermal resistance production technology, use membrane process to change the original wound, preparation of thin film platinum thermal resistance. It is made of submicron or microns thick platinum film and its attached substrates. Is the scope of its temperature 50 - 600℃。 At present domestic film platinum thermal resistance precision can reach the German standard ( DIN) The class B, technically are still gap with the international advanced level. As small film heat capacity, thermal conductivity, and substrate is good insulation materials, thin film platinum thermal resistance can accurately measure the true temperature of the surface. 1, the characteristics of the thin film platinum thermal resistance (1) can be made into high value components ( Such as 1000 Ω) , suitable for blending display instrument and easy to use, stable and reliable. (2) the high sensitivity, fast response, the velocity is zero. Response time (4 m/s of the water, τ0。 5) To zero. 15s。 (3) shape size small ( About 5 mm x 2 mm x 1. 3mm) , easy to install in the narrow place. (4) can be mass production automation, low cost, which is about the same winding resistance of 1/2 - price A third. (5) the disadvantage is that solid particles positive scour resistance is poor. Platinum thermal resistance: yunrun. com. cn/product/123。 Html2, thin film platinum thermal resistance, and the method for the preparation of vacuum deposition and cathode sputtering method, etc. Main process is as follows: substrate phlogistic magic polishing - cleaning - platinum evaporation or vacuum deposition in the alumina substrate - automatic method on the resistance to intercept single element, the ultrasonic bonding wire - coated glass glaze - electricity detection and selection. 3, film platinum thermal resistance of the resistance and temperature relationship platinum thermal resistance of the resistance is composed of two parts: with the temperature change of the resistance RT and the residual resistance RT does not change with temperature. They based on the relationship between resistance and temperature: R ( T) = RT + RT = 100×{ 1+RT/( RT+Rt) ×A×T+RT/( RT+Rt) B××T2} , the formula of A and B is constant. 4, thin film platinum thermal resistance applied film platinum thermal resistance of the mature production technology, high output. Applicable to the surface, small area, fast thermometer need high value components. Zui recent film production process and improve the platinic resistance. Platinum developed into batter, the photographic plate printing technology, attach the platinum in the platinum film is formed on ceramic substrate. Within 2 microns in film thickness with lead, protect the glaze by laser etching resistance. The film platinum thermal resistance with good long-term stability. After working 1000 h at 600 ℃ temperature, its resistance change < 0. 02%. Thin film platinum thermal resistance of the wire vary with different working temperature: - 200 ~ 150 ℃, material: lead palladium silver alloy. Φ0。 25mm×10mm。 - 50 ~ 400 ℃, the wire material: palladium silver alloy. Φ0。 25mm×10mm。 - 50 ~ 600 ℃, material: lead platinum and nickel alloys. Φ0。 25mm×10mm。 - 60 ~ 850 ℃, material: lead platinum rhodium. Φ0。 25mm×10mm。